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A 125L vacuum plasma cleaning system featuring PLC touchscreen control, a customizable stainless steel or aluminum chamber, dual-frequency RF power (40 kHz \/ 13.56 MHz), and a 10 Pa vacuum environment for large-batch processing and research applications.<\/p>\n","protected":false},"featured_media":421,"template":"","meta":{"inline_featured_image":false},"products":[28],"class_list":["post-257","product","type-product","status-publish","has-post-thumbnail","hentry","products-plasma-cleaners"],"yoast_head":"\n125L Vacuum Plasma Cleaner for Batch Processing | Fari Plasma<\/title>\n<meta name=\"description\" content=\"High-throughput vacuum plasma cleaning system with a 125 L customizable chamber, dual-frequency RF (40 kHz \/ 13.56 MHz), PLC touchscreen control, and 10 Pa vacuum. 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