{"id":2373,"date":"2026-01-27T17:59:21","date_gmt":"2026-01-27T09:59:21","guid":{"rendered":"https:\/\/www.fariplasmatech.com\/?post_type=product&p=2373"},"modified":"2026-03-17T12:20:32","modified_gmt":"2026-03-17T04:20:32","slug":"gd-20rf-plasma-asher","status":"publish","type":"product","link":"https:\/\/www.fariplasmatech.com\/ja\/product\/gd-20rf-plasma-asher\/","title":{"rendered":"GD-20RF Plasma Asher"},"content":{"rendered":"","protected":false},"excerpt":{"rendered":"

GD-20RF is a single-chamber plasma ashing system designed for controlled photoresist stripping and dry residue removal in semiconductor and microfabrication processes. It provides stable plasma operation with recipe-driven control and configurable gas chemistry to support sensitive films and complex device structures.<\/p>\n","protected":false},"featured_media":2377,"template":"","meta":{"inline_featured_image":false},"products":[30],"class_list":["post-2373","product","type-product","status-publish","has-post-thumbnail","hentry","products-semiconductor-plasma-equipment"],"yoast_head":"\nGD-20RF Plasma Asher \u2013 Photoresist Stripping | Fari Plasma<\/title>\n<meta name=\"description\" content=\"Single-chamber plasma ashing for controlled photoresist stripping in semiconductor and microfabrication workflows. 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