{"id":276,"date":"2025-12-10T03:46:07","date_gmt":"2025-12-10T03:46:07","guid":{"rendered":"https:\/\/www.fariplasmatech.com\/product\/icp-inductively-coupled-etcher\/"},"modified":"2026-03-17T10:49:07","modified_gmt":"2026-03-17T02:49:07","slug":"icp-inductively-coupled-etcher","status":"publish","type":"product","link":"https:\/\/www.fariplasmatech.com\/ja\/product\/icp-inductively-coupled-etcher\/","title":{"rendered":"ICP Inductively Coupled Etcher"},"content":{"rendered":"","protected":false},"excerpt":{"rendered":"

The ICP inductively coupled plasma etcher integrates dual RF sources to deliver controlled, high-uniformity etching across dielectric, metal, and compound semiconductor materials. The dual-chamber configuration enhances contamination control and supports stable operation in semiconductor manufacturing environments.<\/p>\n","protected":false},"featured_media":371,"template":"","meta":{"inline_featured_image":false},"products":[30],"class_list":["post-276","product","type-product","status-publish","has-post-thumbnail","hentry","products-semiconductor-plasma-equipment"],"yoast_head":"\nICP Inductively Coupled Plasma Etcher | Fari Plasma<\/title>\n<meta name=\"description\" content=\"Dual RF sources, high-density plasma, and a dual-chamber design for contamination control. Etch oxides, nitrides, metals, and III-V semiconductors with precise, uniform results across production runs.\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.fariplasmatech.com\/ja\/product\/icp-inductively-coupled-etcher\/\" \/>\n<meta property=\"og:locale\" content=\"ja_JP\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"ICP Inductively Coupled Plasma Etcher | Fari Plasma\" \/>\n<meta property=\"og:description\" content=\"Dual RF sources, high-density plasma, and a dual-chamber design for contamination control. 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