{"id":290,"date":"2025-12-10T03:46:08","date_gmt":"2025-12-10T03:46:08","guid":{"rendered":"https:\/\/www.fariplasmatech.com\/product\/rie-plasma-resist-stripping-system\/"},"modified":"2026-03-17T11:58:03","modified_gmt":"2026-03-17T03:58:03","slug":"rie-plasma-resist-stripping-system","status":"publish","type":"product","link":"https:\/\/www.fariplasmatech.com\/ja\/product\/rie-plasma-resist-stripping-system\/","title":{"rendered":"RIE Plasma Resist Stripping System"},"content":{"rendered":"","protected":false},"excerpt":{"rendered":"

RIE Plasma Resist Stripping System provides controlled, uniform plasma processing for photoresist removal and surface preparation in semiconductor and advanced manufacturing environments.<\/p>\n","protected":false},"featured_media":329,"template":"","meta":{"inline_featured_image":false},"products":[30],"class_list":["post-290","product","type-product","status-publish","has-post-thumbnail","hentry","products-semiconductor-plasma-equipment"],"yoast_head":"\nRIE Plasma Resist Stripping System | Fari Plasma<\/title>\n<meta name=\"description\" content=\"Precise photoresist removal with reactive ion etching. 0\u2013300 W adjustable RF power, multi-gas support (O2, Ar, CF4), and PLC touch control for semiconductor-grade surface prep.\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.fariplasmatech.com\/ja\/product\/rie-plasma-resist-stripping-system\/\" \/>\n<meta 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