{"id":230,"date":"2025-12-01T06:38:29","date_gmt":"2025-12-01T06:38:29","guid":{"rendered":"https:\/\/www.fariplasmatech.com\/?post_type=technology&p=230"},"modified":"2025-12-12T02:32:20","modified_gmt":"2025-12-12T02:32:20","slug":"argon-vs-oxygen-plasma-cleaning","status":"publish","type":"technology","link":"https:\/\/www.fariplasmatech.com\/ja\/technology\/argon-vs-oxygen-plasma-cleaning\/","title":{"rendered":"Argon vs Oxygen Plasma Cleaning"},"content":{"rendered":"\n

Plasma cleaning has become an indispensable technology across numerous industries, from semiconductors to advanced materials processing. At Fari Plasma, we understand that selecting the correct plasma gas is crucial for achieving optimal results. <\/p>\n\n\n\n

Plasma Cleaning Fundamentals<\/h2>\n\n\n\n

Plasma is ionized gas containing electrons, ions, and neutral atoms. When energy is applied to gas in a vacuum, it ionizes and creates plasma that removes surface contaminants.<\/p>\n\n\n\n

The cleaning mechanism involves several processes:<\/p>\n\n\n\n