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High-stability vacuum plasma cleaning system with adjustable 2000 W power and dual-frequency operation (40 kHz \/ 13.56 MHz), featuring a customizable chamber, PLC touchscreen control, and multi-gas support for continuous industrial production.<\/p>\n","protected":false},"featured_media":402,"template":"","meta":{"inline_featured_image":false},"products":[28],"class_list":["post-265","product","type-product","status-publish","has-post-thumbnail","hentry","products-plasma-cleaners"],"yoast_head":"\nHigh-Power Vacuum Plasma Treatment | Fari Plasma<\/title>\n<meta name=\"description\" content=\"2000 W, dual-frequency (40 kHz \/ 13.56 MHz), customizable chamber \u2014 this high-power vacuum plasma surface treatment system is engineered for stable, continuous industrial production.\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" 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