{"id":270,"date":"2025-12-10T03:46:06","date_gmt":"2025-12-10T03:46:06","guid":{"rendered":"https:\/\/www.fariplasmatech.com\/product\/icp-cvd-dual-chamber-system\/"},"modified":"2026-03-16T19:35:30","modified_gmt":"2026-03-16T11:35:30","slug":"icp-cvd-dual-chamber-system","status":"publish","type":"product","link":"https:\/\/www.fariplasmatech.com\/ko\/product\/icp-cvd-dual-chamber-system\/","title":{"rendered":"ICP CVD Dual-Chamber System"},"content":{"rendered":"","protected":false},"excerpt":{"rendered":"

High-density ICP-CVD dual-chamber deposition system designed for SiN, SiO\u2082 and a-Si thin-film growth. The platform supports uniform and repeatable deposition for semiconductor, photovoltaic, and advanced materials manufacturing.<\/p>\n","protected":false},"featured_media":385,"template":"","meta":{"inline_featured_image":false},"products":[30],"class_list":["post-270","product","type-product","status-publish","has-post-thumbnail","hentry","products-semiconductor-plasma-equipment"],"yoast_head":"\nICP CVD Dual-Chamber System | Fari Plasma<\/title>\n<meta name=\"description\" content=\"Scale up SiN, SiO\u2082 and a-Si deposition with parallel processing. This ICP CVD dual-chamber system boosts throughput for semiconductor, photovoltaic and advanced coating production with high-density plasma.\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.fariplasmatech.com\/ko\/product\/icp-cvd-dual-chamber-system\/\" \/>\n<meta property=\"og:locale\" content=\"ko_KR\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"ICP CVD Dual-Chamber System | Fari Plasma\" \/>\n<meta property=\"og:description\" content=\"Scale up SiN, SiO\u2082 and a-Si deposition with parallel processing. 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