{"id":271,"date":"2025-12-10T03:46:06","date_gmt":"2025-12-10T03:46:06","guid":{"rendered":"https:\/\/www.fariplasmatech.com\/product\/icp-cvd-plasma-deposition-system\/"},"modified":"2025-12-10T03:46:06","modified_gmt":"2025-12-10T03:46:06","slug":"icp-cvd-plasma-deposition-system","status":"publish","type":"product","link":"https:\/\/www.fariplasmatech.com\/ko\/product\/icp-cvd-plasma-deposition-system\/","title":{"rendered":"ICP CVD Plasma Deposition System"},"content":{"rendered":"","protected":false},"excerpt":{"rendered":"
A high-density ICP CVD plasma deposition system engineered for uniform, low-contamination thin film growth on wafers and substrates. Ideal for semiconductor, MEMS, and specialty coating applications requiring precise process control.<\/p>\n","protected":false},"featured_media":383,"template":"","meta":{"inline_featured_image":false},"products":[30],"class_list":["post-271","product","type-product","status-publish","has-post-thumbnail","hentry","products-semiconductor-plasma-equipment"],"yoast_head":"\n