{"id":272,"date":"2025-12-10T03:46:06","date_gmt":"2025-12-10T03:46:06","guid":{"rendered":"https:\/\/www.fariplasmatech.com\/product\/icp-inductively-coupled-plasma-etcher\/"},"modified":"2025-12-10T03:46:06","modified_gmt":"2025-12-10T03:46:06","slug":"icp-inductively-coupled-plasma-etcher","status":"publish","type":"product","link":"https:\/\/www.fariplasmatech.com\/ko\/product\/icp-inductively-coupled-plasma-etcher\/","title":{"rendered":"ICP Inductively Coupled Plasma Etcher"},"content":{"rendered":"","protected":false},"excerpt":{"rendered":"
High-density ICP etcher designed for precise dry etching of oxides, nitrides, metals and compound semiconductors. Dual-chamber design minimizes exposure while ensuring safe, repeatable semiconductor processing.<\/p>\n","protected":false},"featured_media":381,"template":"","meta":{"inline_featured_image":false},"products":[30],"class_list":["post-272","product","type-product","status-publish","has-post-thumbnail","hentry","products-semiconductor-plasma-equipment"],"yoast_head":"\n