{"id":275,"date":"2025-12-10T03:46:07","date_gmt":"2025-12-10T03:46:07","guid":{"rendered":"https:\/\/www.fariplasmatech.com\/product\/icp-plasma-residue-removal-system\/"},"modified":"2025-12-10T03:46:07","modified_gmt":"2025-12-10T03:46:07","slug":"icp-plasma-residue-removal-system","status":"publish","type":"product","link":"https:\/\/www.fariplasmatech.com\/ko\/product\/icp-plasma-residue-removal-system\/","title":{"rendered":"ICP Plasma Residue Removal System"},"content":{"rendered":"","protected":false},"excerpt":{"rendered":"

The PD-200 ICP plasma residue removal system uses a 13.56 MHz RF source (2 kW) for efficient photoresist and residue ashing. Supports multi-wafer handling for 2\/4″ wafers, temperature control up to 250\u00b0C and tight uniformity \u22645%.<\/p>\n","protected":false},"featured_media":373,"template":"","meta":{"inline_featured_image":false},"products":[30],"class_list":["post-275","product","type-product","status-publish","has-post-thumbnail","hentry","products-semiconductor-plasma-equipment"],"yoast_head":"\nICP Plasma Residue Removal System - Fari Plasma<\/title>\n<meta name=\"robots\" content=\"noindex, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<meta property=\"og:locale\" content=\"ko_KR\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"ICP Plasma Residue Removal System - Fari Plasma\" \/>\n<meta property=\"og:description\" content=\"The PD-200 ICP plasma residue removal system uses a 13.56 MHz RF source (2 kW) for efficient photoresist and residue ashing. 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