{"id":275,"date":"2025-12-10T03:46:07","date_gmt":"2025-12-10T03:46:07","guid":{"rendered":"https:\/\/www.fariplasmatech.com\/product\/icp-plasma-residue-removal-system\/"},"modified":"2026-03-17T10:41:24","modified_gmt":"2026-03-17T02:41:24","slug":"icp-plasma-residue-removal-system","status":"publish","type":"product","link":"https:\/\/www.fariplasmatech.com\/ko\/product\/icp-plasma-residue-removal-system\/","title":{"rendered":"ICP Plasma Residue Removal System"},"content":{"rendered":"","protected":false},"excerpt":{"rendered":"
The PD-200 ICP plasma residue removal system integrates a 13.56 MHz RF source (up to 2 kW) for controlled photoresist stripping and residue removal in semiconductor processes. It supports multi-wafer handling, precise temperature control up to 250\u00b0C, and uniformity \u22645% for stable production performance.<\/p>\n","protected":false},"featured_media":373,"template":"","meta":{"inline_featured_image":false},"products":[30],"class_list":["post-275","product","type-product","status-publish","has-post-thumbnail","hentry","products-semiconductor-plasma-equipment"],"yoast_head":"\n