{"id":277,"date":"2025-12-10T03:46:07","date_gmt":"2025-12-10T03:46:07","guid":{"rendered":"https:\/\/www.fariplasmatech.com\/product\/fr-g800-dual-chamber-pecvd-system\/"},"modified":"2025-12-10T03:46:07","modified_gmt":"2025-12-10T03:46:07","slug":"fr-g800-dual-chamber-pecvd-system","status":"publish","type":"product","link":"https:\/\/www.fariplasmatech.com\/ko\/product\/fr-g800-dual-chamber-pecvd-system\/","title":{"rendered":"FR-G800 Dual-Chamber PECVD System"},"content":{"rendered":"","protected":false},"excerpt":{"rendered":"
FR-G800 PECVD is a dual-chamber plasma-enhanced CVD system for low-temperature deposition of high-quality dielectric and optical thin films. It supports 2\u20138″ wafers and broad R&D and production needs.<\/p>\n","protected":false},"featured_media":369,"template":"","meta":{"inline_featured_image":false},"products":[30],"class_list":["post-277","product","type-product","status-publish","has-post-thumbnail","hentry","products-semiconductor-plasma-equipment"],"yoast_head":"\n