{"id":278,"date":"2025-12-10T03:46:07","date_gmt":"2025-12-10T03:46:07","guid":{"rendered":"https:\/\/www.fariplasmatech.com\/product\/pe-200-pecvd-thin-film-system\/"},"modified":"2025-12-10T03:46:07","modified_gmt":"2025-12-10T03:46:07","slug":"pe-200-pecvd-thin-film-system","status":"publish","type":"product","link":"https:\/\/www.fariplasmatech.com\/ko\/product\/pe-200-pecvd-thin-film-system\/","title":{"rendered":"PE-200 PECVD Thin Film System"},"content":{"rendered":"","protected":false},"excerpt":{"rendered":"
The PE-200 PECVD system provides uniform plasma-enhanced chemical vapor deposition for high-quality dielectric and optical films. It supports 2\u20138″ wafers and processes at 100\u2013400\u00b0C for R&D and production.<\/p>\n","protected":false},"featured_media":367,"template":"","meta":{"inline_featured_image":false},"products":[30],"class_list":["post-278","product","type-product","status-publish","has-post-thumbnail","hentry","products-semiconductor-plasma-equipment"],"yoast_head":"\n