{"id":279,"date":"2025-12-10T03:46:07","date_gmt":"2025-12-10T03:46:07","guid":{"rendered":"https:\/\/www.fariplasmatech.com\/product\/single-chamber-pecvd-deposition-system\/"},"modified":"2025-12-10T03:46:07","modified_gmt":"2025-12-10T03:46:07","slug":"single-chamber-pecvd-deposition-system","status":"publish","type":"product","link":"https:\/\/www.fariplasmatech.com\/ko\/product\/single-chamber-pecvd-deposition-system\/","title":{"rendered":"Single-Chamber PECVD Deposition System"},"content":{"rendered":"","protected":false},"excerpt":{"rendered":"
Single-chamber PECVD system for low-temperature plasma-enhanced deposition of SiO2 and dielectric thin films. Optimized for high-quality, dense layers used in semiconductors, photovoltaics, and photonics.<\/p>\n","protected":false},"featured_media":365,"template":"","meta":{"inline_featured_image":false},"products":[30],"class_list":["post-279","product","type-product","status-publish","has-post-thumbnail","hentry","products-semiconductor-plasma-equipment"],"yoast_head":"\n