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The FR-G200 single-chamber RIE reactive ion etcher delivers precise, anisotropic dry etching for silicon, SiN and SiO2 with high selectivity and repeatability for semiconductor, MEMS and nano-fabrication.<\/p>\n","protected":false},"featured_media":333,"template":"","meta":{"inline_featured_image":false},"products":[30],"class_list":["post-288","product","type-product","status-publish","has-post-thumbnail","hentry","products-semiconductor-plasma-equipment"],"yoast_head":"\nSingle-Chamber RIE Reactive Ion Etcher - Fari Plasma<\/title>\n<meta name=\"robots\" content=\"noindex, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<meta property=\"og:locale\" content=\"ko_KR\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Single-Chamber RIE Reactive Ion Etcher - Fari Plasma\" \/>\n<meta property=\"og:description\" content=\"The FR-G200 single-chamber RIE reactive ion etcher delivers precise, anisotropic dry etching for silicon, SiN and SiO2 with high selectivity and repeatability for semiconductor, MEMS and nano-fabrication.\" \/>\n<meta property=\"og:url\" content=\"https:\/\/www.fariplasmatech.com\/ko\/product\/single-chamber-rie-reactive-ion-etcher\/\" \/>\n<meta property=\"og:site_name\" content=\"Fari Plasma\" \/>\n<meta name=\"twitter:card\" content=\"summary_large_image\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\/\/schema.org\",\"@graph\":[{\"@type\":\"WebPage\",\"@id\":\"https:\/\/www.fariplasmatech.com\/ko\/product\/single-chamber-rie-reactive-ion-etcher\/\",\"url\":\"https:\/\/www.fariplasmatech.com\/ko\/product\/single-chamber-rie-reactive-ion-etcher\/\",\"name\":\"Single-Chamber RIE Reactive Ion Etcher - 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