{"id":291,"date":"2025-12-10T03:46:08","date_gmt":"2025-12-10T03:46:08","guid":{"rendered":"https:\/\/www.fariplasmatech.com\/product\/pe-200-rie-reactive-ion-etcher\/"},"modified":"2025-12-10T03:46:08","modified_gmt":"2025-12-10T03:46:08","slug":"pe-200-rie-reactive-ion-etcher","status":"publish","type":"product","link":"https:\/\/www.fariplasmatech.com\/ko\/product\/pe-200-rie-reactive-ion-etcher\/","title":{"rendered":"PE-200 RIE Reactive Ion Etcher"},"content":{"rendered":"","protected":false},"excerpt":{"rendered":"

The PE-200 (RIE) is a high-precision reactive ion etcher engineered for semiconductor microfabrication. It delivers uniform, controllable etching for silicon, SiN, SiO2 and advanced microstructures.<\/p>\n","protected":false},"featured_media":325,"template":"","meta":{"inline_featured_image":false},"products":[30],"class_list":["post-291","product","type-product","status-publish","has-post-thumbnail","hentry","products-semiconductor-plasma-equipment"],"yoast_head":"\nPE-200 RIE Reactive Ion Etcher - Fari Plasma<\/title>\n<meta name=\"robots\" content=\"noindex, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<meta property=\"og:locale\" content=\"ko_KR\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"PE-200 RIE Reactive Ion Etcher - Fari Plasma\" \/>\n<meta property=\"og:description\" content=\"The PE-200 (RIE) is a high-precision reactive ion etcher engineered for semiconductor microfabrication. 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