The GD-10RF is a compact RF O2 plasma cleaner built for lab-scale and small-batch production: a 13.56 MHz RF source drives a 10 L stainless chamber, with dual gas lines that give precise control over oxygen-based cleaning and activation recipes.
| Product | Vacuum plasma cleaner |
| Model | GD-10RF |
| Control System | PLC + touch screen |
| Power Frequency | 13.56 MHz |
| Power Supply | AC220V (±10V) |
| Power Output | 300 W (adjustable) |
| Gas Lines | 2-channel float flow control |
| Process Control | Automatic and manual modes |
| Chamber Size (mm) | 200 × 250 × 200 (W × D × H), 316 stainless steel |
| Carrying Tray | 175 × 185 (W × D), 3 layers |
| Overall Dimensions (mm) | 600 × 560 × 600 (L × D × H) |
| Chamber Volume | 10 L |
| Vacuum Range | 10–30 Pa |
| Admissible Gases | Argon, Oxygen, Nitrogen, Air, H2+N2 (mixed gases) |
Running oxygen at 13.56 MHz keeps the discharge stable and even, breaking down organic residues without the localized heating or arcing risk lower-frequency systems can show on glass, PTFE, and other non-metals. See the gas selection guide.
The chamber fits parts up to roughly 200 × 250 × 200 mm, and the carrying tray holds three layers per batch, so larger fixtures need a bigger chamber.
Fits parts up to roughly 200 × 250 × 200 mm; the tray holds three layers per batch.
Single sealed chamber: each run needs venting to atmosphere before reloading, so throughput is manual.
Easily-oxidizing metals like copper and silver need an argon blend.
Built for lab and small-batch work; higher-volume production should move to a larger or inline system.
Fari Plasma designs and builds the GD-10RF in-house rather than reselling third-party hardware, and every unit is inspected before it ships.
The GD-10RF suits lab-scale and pilot work. For different capacity or power, sibling systems keep the same O2-capable process without forcing a chamber redesign.
For batch lab work, the Lab Vacuum Plasma Cleaning System offers a larger chamber.
For tougher etch or activation jobs, the High-Power Vacuum Plasma Treatment delivers more power.
For production-scale volume, the 600L Vacuum Plasma Cleaning System handles larger throughput.
For an alternate configuration in the same footprint, the Compact Vacuum Plasma Cleaner is available.
Request a quote for the GD-10RF, or ask about OEM/ODM configuration — chamber size, gas line count, and control interface can be adjusted to match your process. Contact us for a technical evaluation and current specs.
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