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High-density ICP-CVD dual-chamber deposition system designed for SiN, SiO₂ and a-Si thin-film growth. The platform supports uniform and repeatable deposition for semiconductor, photovoltaic, and advanced materials manufacturing.10 Dec, 2025ICP CVD Dual-Chamber System -
The GM-6000 low-temperature plasma system is designed for inline and automated processing, featuring a quiet belt-free nozzle, panel and remote analog power control, and integrated safety alarms for stable production use.10 Dec, 2025Low-Temperature Inline Atmospheric Plasma Surface Treatment -
Compact inline GM-5000 plasma treatment system featuring a beltless silent nozzle, panel and remote analog power control, with adjustable output up to 1200 W for automated production integration.10 Dec, 2025Compact Inline Plasma Surface Activation -
The GM-2000 is a low-temperature atmospheric plasma treatment system designed for material processing of plastics, metals, glass, and electronic components prior to coating, printing, or assembly processes.10 Dec, 2025Low-Temperature Plasma Surface Activation -
Compact vacuum plasma cleaner with PLC and touch-screen control, 316 stainless and imported aluminum chamber, dual precision gas channels and 300W adjustable generator — ideal for small-batch production and laboratory use.10 Dec, 2025Compact Vacuum Plasma Surface Cleaning -
High-stability vacuum plasma cleaning system with adjustable 2000 W power and dual-frequency operation (40 kHz / 13.56 MHz), featuring a customizable chamber, PLC touchscreen control, and multi-gas support for continuous industrial production.10 Dec, 2025High-Power Vacuum Plasma Surface Treatment
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