Plasma Cleaning Technology & Process

Atmospheric plasma treatment modifies and cleans surfaces at ambient pressure, offering fast, inline activation without the need for vacuum chambers.

Plasma activation increases surface energy to improve adhesion for bonding, coating, printing, and sealing applications.

Plasma ashing uses oxygen-based plasma to decompose and completely remove photoresist films without damaging underlying layers.

Plasma etching precisely removes material layers through chemical reactions and ion bombardment, enabling fine patterning and micro-structuring.

Plasma cleaning removes organic residues and surface contaminants using reactive ions and radicals, delivering a highly clean and energy-rich surface.