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Semiconductor Plasma Equipment

High-precision plasma systems designed for semiconductor and microelectronics manufacturing, supporting wafer processing, micro-scale surface preparation, and advanced component fabrication.

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Products

Semiconductor Plasma Equipment

Engineered plasma systems for wafers, chips, MEMS devices, and optical components. Stable chamber architecture and advanced process control support consistent plasma processing in both laboratory and production environments.

Supports semiconductor processes including photoresist ashing, descum treatment, wafer surface preparation, and pre-bond processing.

Precise plasma control
Clean, stable chamber
For wafers, chips, MEMS

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Key Features

High-Uniformity Plasma Treatment

Designed for semiconductor manufacturing, providing uniform plasma distribution across wafers and micro-scale components for stable and repeatable processing conditions.
Precision Process Control System

Equipped with PLC or PC-based control, enabling precise adjustment of gas flow, RF power, timing parameters, and chamber conditions for repeatable semiconductor processing.
Low-Contamination Chamber Design

Constructed from high-purity materials with optimized airflow and vacuum pathways to prevent particle generation, making it suitable for cleanroom-grade production.
Flexible Configuration & Custom Modules

Supports multiple chamber sizes, RF power configurations, gas delivery systems, electrode structures, and automation interfaces for semiconductor manufacturing environments.

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Our Semiconductor Plasma Equipment Machine

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Advantages

Powerful Manufacturing Capabilities

Manufacturing
Quality Control
R&D

Manufacturing

Our semiconductor plasma systems are produced using CNC-machined components, high-precision chamber construction, and strict electrical integration. Each system undergoes vacuum leakage tests, RF stability tests, and plasma uniformity verification to ensure long-term accuracy and reliability.

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Quality Control

Every machine is inspected under semiconductor-grade standards. We evaluate plasma density uniformity, chamber cleanliness, RF output stability, and process repeatability. Only equipment that meets stringent performance thresholds is approved for delivery.

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Research & Development

Our R&D team continuously advances plasma source technology, chamber geometry, and RF control algorithms. We collaborate with semiconductor labs, universities, and industry partners to develop solutions for MEMS fabrication, wafer processing, chip packaging, and emerging semiconductor materials.

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sERVICES

Worry-Free Service

We provide full lifecycle support—from process consultation and system installation to long-term maintenance—ensuring stable operation for semiconductor manufacturing environments.

15+ Years of Expertise

Extensive experience in developing plasma systems for semiconductor and microelectronic applications.
Technical Training

Comprehensive training on system operation, process optimization, and maintenance, available remotely or onsite.
Warranty

One-year standard warranty with lifetime technical support for semiconductor customers.
Customizable

Chamber size, RF power, software interface, fixtures, and automation options can be fully customized for specific wafer sizes or micro-component manufacturing needs.