GD-10 Compact Vacuum Plasma Cleaner

The GD-10 is a compact laboratory vacuum plasma cleaner with PLC + touch screen control, dual gas channels and a uniform electrode design. Ideal for small-scale production and scientific experiments requiring reliable surface activation and cleaning.

Precision cleaning with uniform plasma distribution
PLC + touch screen — simple operation and maintenance
Customizable chamber and dual gas flow control

Get A Quote Tech Specs

Tech Specs

Product Name	Vacuum Plasma Cleaner
Model	GD-10
Control System	PLC + Touch Screen
Power Frequency	40 kHz
Supply Voltage	AC 220V (±10V)
Power	300 W (adjustable)
Gas Channels	2 channels with float flow meters
Process Control	Automatic and Manual modes
Chamber Inner Dimensions (mm)	200 × 250 × 200 (W × D × H), stainless steel
Carrier Capacity	175 × 185 (W × D), 3 levels
External Dimensions (mm)	600 × 560 × 400 (L × D × H)
Chamber Volume	10 L
Vacuum Level	10–30 Pa
Compatible Gases	Argon, Oxygen, Nitrogen, Air, H2+N2 (mixed), etc.

Key Features

User-Friendly PLC Touch Control

Integrated PLC with a responsive touch screen simplifies operation, recipe management and maintenance, enabling repeatable processes and quick adjustment for lab or small production runs.
Dual Gas Flow Precision Control

Two independent float flow-controlled gas channels allow precise mixture control for different process chemistries, improving repeatability and enabling a wide range of surface treatments.
Uniform Plasma Electrode Design

A specially designed electrode structure delivers uniform plasma across the chamber, ensuring consistent surface activation and cleaning for multiple parts and layered loading configurations.
Compact Laboratory Footprint

Small external dimensions and a 10 L chamber make the unit ideal for laboratory benches and small-scale production lines while still accommodating multi-layer carriers for throughput.
Adjustable Power and Process Modes

Adjustable 300 W power output and both automatic and manual process control modes provide flexibility to optimize treatment intensity and cycle times for sensitive materials.
Wide Gas Compatibility

Supports common process gases including argon, oxygen, nitrogen, air and H2/N2 mixes, enabling applications from cleaning and activation to gentle surface modification for diverse materials.

Plasma Cleaning Process

Plasma Generation

Process gas is energized and converted into a reactive plasma containing ions, electrons, and radicals.
Plasma–Surface Interaction

High-energy plasma species reach the material surface and interact with contaminants at the molecular level.
Chemical Reaction

Reactive ions and radicals break down organic residues and surface contaminants through controlled chemical reactions.
Volatilization

The reaction products are converted into volatile compounds and enter the gas phase.
Removal from Surface

Gaseous by-products desorb from the surface and are evacuated, leaving a clean, activated material surface.