AF-G40 is a bench-top atmospheric plasma system with a rotary platform, designed for stable treatment of circular components. Continuous rotation ensures consistent plasma exposure for reliable surface activation before bonding, printing, or coating.

| Input Voltage | AC220 V |
| Output Power | 1.5KW |
| Processing Height | 8-12 mm |
| Processing Width | 300 mm |
| Size(L*W*H) | 450*400*620mm |
| Gas Used | Air, N2(optional) |
| Transmission Speed | 9-10 m/min |
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