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Semiconductor Plasma Equipment

High-precision plasma systems engineered for micro-scale cleaning, surface activation, and material modification in semiconductor, microelectronics, and advanced component manufacturing.

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Products

Semiconductor Plasma Equipment

Reliable, contamination-free plasma systems for wafers, chips, MEMS, and optical parts. Advanced control and a stable chamber ensure uniform, repeatable processing for both R&D and production.

Supports ashing, descum, surface activation, micro-cleaning, and pre-bond prep.

Precise plasma control
Clean, stable chamber
For wafers, chips, MEMS

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Key Features

High-Uniformity Plasma Treatment

Engineered for semiconductor-grade consistency, delivering uniform plasma distribution across wafers and micro-components to ensure stable process results.
Precision Process Control System

Equipped with PLC or PC-based control, allowing accurate adjustment of gas flow, power, timing, and chamber conditions for repeatable and traceable processes.
Low-Contamination Chamber Design

Constructed from high-purity materials with optimized airflow and vacuum pathways to prevent particle generation, making it suitable for cleanroom-grade production.
Flexible Configuration & Custom Modules

Supports multiple chamber sizes, RF power options, gas channel configurations, electrode types, and automation upgrades to match your semiconductor workflow.

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Our Semiconductor Plasma Equipment Machine

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Advantages

Powerful Manufacturing Capabilities

Manufacturing
Quality Control
R&D

Manufacturing

Our semiconductor plasma systems are produced using CNC-machined components, high-precision chamber construction, and strict electrical integration. Each system undergoes vacuum leakage tests, RF stability tests, and plasma uniformity verification to ensure long-term accuracy and reliability.

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Quality Control

Every machine is inspected under semiconductor-grade standards. We evaluate plasma density uniformity, chamber cleanliness, RF output stability, and process repeatability. Only equipment that meets stringent performance thresholds is approved for delivery.

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Research & Development

Our R&D team continuously advances plasma source technology, chamber geometry, and RF control algorithms. We collaborate with semiconductor labs, universities, and industry partners to develop solutions for MEMS manufacturing, micro-cleaning, chip packaging, and next-generation materials.

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sERVICES

Worry-Free Service

We provide full lifecycle support—from process consultation and system installation to long-term maintenance—ensuring stable operation for semiconductor manufacturing environments.

15+ Years of Expertise

Extensive experience in developing plasma systems for semiconductor and microelectronic applications.
Technical Training

Comprehensive training on system operation, process optimization, and maintenance, available remotely or onsite.
Warranty

One-year standard warranty with lifetime technical support for semiconductor customers.
Customizable

Chamber size, RF power, software interface, fixtures, and automation options can be fully customized for specific wafer sizes or micro-component manufacturing needs.